Alexander
A. Lebedev Laboratory
of Semiconductor Devices Physics
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Alexander
A. Lebedev,
Head
of the Laboratory
of Semiconductor
Devices Physics
Laboratory
of Semiconductor Devices Physics Solid
State Electronics Division Ioffe
Institute of Russian Academy of Sciences,
Politekhnicheskaya
ul.
26, St. Petersburg, 194021, Russia
Tel:
+7
(812) 292 7125
Fax:+7
(812) 297 1017 E-mail:
Shura.lebe@mail.ioffe.ru Home
Page: http://www.ioffe.ru/semdev/lebedev.htm
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Born:
March 10,1959, St.Petersburg (Leningrad).
Specialist
in physics, technology and device application of wide band gap
semiconductors: SiC and SiC-based devices, capacative
spectroscopy: DLTS technique was applied for investigations
of deep levels in SiC for the first time. New technology for
different SiC-based devices was developed in the group headed by.
A. Lebedev.
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EDUCATION
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1998
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Academic
Degree: Doctor
of Sciences in Physics and Mathematics,
from A. F. Ioffe Physical-Technical Institute. Thesis:
"Capacitance
spectroscopy of
the Silicon Carbide ".
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1991
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Academic
Degree: Ph.
D. in Physics and Mathematics from
A. F. Ioffe Physical-Technical Institute. Thesis:"Deep
centers
and their influence on recombination processes in 6H and 4H
SiC-based diodes".
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1983
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Master
Degree in
Optoelectronic, St
Petersburg Electrical Engineering University
.
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EMPLOYMENT
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A.
F. Ioffe Physical-Technical Institute of Russian
Academy
of
Sciences,
St. Petersburg, Russia
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Deputy
Director of Solid State Electronic Division
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(2008
– present)
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Leading
Researcher, Head
of
the Laboratory
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(1999
- present)
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Senior
Researcher
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(1992-1999)
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Researcher
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(1989-1992)
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Junior
Researcher
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(1986-1989)
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Engineer
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(1983-1986)
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TEACHING
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St.
Petersburg Electrical
Engineering University Full
Professor
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(2004
- present)
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HONORS
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Prizes
for the best papers of the Ioffe Institute (1985, 2005)
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PROFESSIONAL
COUNCILS:
2008
- present. Memeber of Scientific Council of the
Ioffe Institute (on PhD & Doctor science degree degree
)
2001-2008.
Memeber of Scientific Council of the Ioffe Institute (on
PhD degree
1999 - present.
Member of Scientific Council of Solid State Electronic Division
of the Ioffe Institute.
1986-1992. Member
of Scientific Council of Young Scientists of the Ioffe
Institute.
2006
– present. Member of Scientific Council of the Ioffe
Institute
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PROFESSIONAL
ACTIVITIES:
Member
of Program Committee of III, IV, V and VI Intern. Seminar on
Silicon Carbide and Related Materials, May 2000, May 2002 and
May 2004, may 2009 Novgorod the Great,
Russia
Invited
Speaker on several Rusian and International Scientific
Conferences.
Member of Steering
Committee of European Conf. on SiC and Related Materials, Sept.
2006 (Newcastle, UK), Sept 2008 (Barcelona, Span), Sept 2010
(Oslo, Norway).
Member
of International Advisory Board CIMTEC 2010 of Symposium H
“Advances in Electrical, Magnetic and Optical Ceramics”,
June 2010 Tuscany, Italy
Member
of Scientific Program Committee of 14-th Conference on
Semiconductor and Insulating Materials (SIMC-XIV), May 2007,
Fayetteville, Aransas, USA
Editor
of the Central European Science Journal
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VISITING
POSITIONS
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Visiting
Researcher, University
of
Aveiro,
Aveiro, Portugal (
1995).
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MAIN
ACHIEVEMENTS
The
parameters of main intrinsic electrically active centers were
defined in 4H- and 6H- SiC. Interaction between deep levels
and point defects was studied. Effects of the traps on
recombination processes were investigated.
Capacitance spectroscopy
technique was modified and applied for investigation of wide
band gap semiconductors.
Several
types of semiconductor devices based on SiC were developed.
Theire parameters were
studied in wide temperature interval.
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PUBLICATIONS:
About
250 publications in refereed journals and in Proceedings of
International and National Conferences on properties of
Silicon Carbide and SiC-based electron devices, capacitance
spectroscopy of the deep centers in wide bang gap materials,
investigation of radiation defects in semiconductors, physics of
Lights Emitting Diodes (LEDs), epitaxial and heteroepiotaxial SiC
growth. Three Ph.D. dissertation was prepared under his
supervision. Four patents on solid-state devices.
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BOOKS
& REVIEWS
Lebedev
A. A "Deep Level defects in Silicon
Carbide" in M. S. Shur, S. L. Rumyantsev and M. E.
Levinshtein, Editors: "SiC Materials and Devices –
vol. 2", World Scientific, 2007, ISBN 981-270-383-5
Lebedev
A. A. "Heterojunctions and super
lattices based on silicon carbide" Topical Review.
Semicond. Sci. and Technol. 21,
R17-R34, (2006)
Lebedev
A. A.,
Anikin M. M., Ivanov P.A., Pyatko S. N., Strel'chuk A. M.,
Syrkin A. L. “High temperature discrete devices in 6H-SiC:
sublimation epitaxial growth, device technology and electrical
performance.” in book "Semiconductor
interfaces and microstructures" ed.
by Z. C. Feng, World
Scientific,
Singapore, pp.280-311 (1992).
Lebedev
A. A. ,
Chelnokov V. E. "High power SiC devices. New result and
prospects", in Proc. 1998 High Temperature Electronic
Materials, devices and Sensors Conference, ed. By
I. Golecki, , IEEE
Catalog, no
98EX132 (1998), pp. 29-39.
Lebedev
A. A.,
Chelnokov V. E. "Future trends in SiC-based microelectronic
devices", in book Fundamental
Aspects of Ultrathin Dielectrics on Si-based Devices,
E. Garfunkel et al. (eds),
Kluwer
Academic
Publishers,
Printed in the Netherlands (1998), pp. 431-445.
Lebedev
A. A. "Deep
level centers in Silicon Carbide" ( Review),
Semiconductors,
v. 33,
pp. 107-130 (1999).
Lebedev
A.A., "SiC electronics in the new
century", J. of Wide
Bandgap Materials, v.8,
pp.129136 (2000).
Lebedev,
A.A., Ivanov, A.M., Strokan, N.B., "Radiation resistance of
SiC and nuclear-radiation detectors based on SiC films",
Semiconductors,
v.38,
No.2, pp.125-147 (2004).
Lebedev
A.A., "Deep-level defects in SiC
material and devices", in
book: "Silicon
Carbide: Material, Proceeding and Devices",
ed. by Z.C.Feng and J.H.Zhao, p. 121-163 (2004) Taylor and
Francis books Inc.
Lebedev,
A.A., Ivanov, A.M., Strokan, N.B., " SiC nuclear-radiation
detectors ", in
book: "SiC
Power Materials, Devices and
Applications", ed. by
Z.C.Feng, p.411-445 (2004), Springer.
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This
page was last updated 29-08-2011.
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